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作 者:黎琦 朱归胜[1] 徐华蕊[1] 赵昀云[1] 许积文[1] 龙神峰 韦婷婷 LI Qi;ZHU Guisheng;XU Huarui;ZHAO Yunyun;XU Jiwen;LONG Shenfeng;WEI Tingting(Guangxi Key Laboratory of Information Materials,Engineering Research Center ofMinistry of Education of Electronic Information Materials and Devices,School of Materials andEngineering,Guilin University of Electronic Science and Technology,Guilin 541004,China)
机构地区:[1]桂林电子科技大学材料科学与工程学院,电子信息材料与器件教育部工程研究中心,广西信息材料重点实验室,广西桂林541004
出 处:《功能材料》2025年第2期2120-2125,共6页Journal of Functional Materials
基 金:国家自然科学基金项目(U21A2065,62364007);广西科技计划项目(桂科AA21077018,桂科AD23023013,桂科AB23075218);桂林市科学研究与技术开发计划项目(20220120-1);电子信息材料与器件教育部工程研究中心重点基金项目(EIMD-AA202001)。
摘 要:高性能的氧化铟锡(ITO)粉体是制备高性能ITO靶材的关键。利用InCl_(3)·4H_(2)O、SnCl_(4)·5H_(2)O和氨水作为原料,在微反应器中成功合成颗粒大小均匀、分散性良好的ITO纳米粉体,该粉体比表面积为36.86 m^(2)/g,颗粒尺寸为22.75 nm。研究了不同前驱体浓度、煅烧温度和反应温度对ITO粉体性能及其在1400~1580℃下的陶瓷烧结性能。在1580℃下保温4 h烧结条件下,获得了相对密度为98.46%的ITO陶瓷,其电阻率为3.532×10^(-4)Ω·cm,陶瓷表面和断面均无气孔。研究结果显示,由于微反应通道内的剧烈碰撞和均匀的爆炸形核过程,利用微反应器共沉淀反应制备的ITO粉体颗粒具有较小的粒径、均匀的颗粒大小和更好的分散性。High-quality indium tin oxide(ITO)powder is crucial for fabricating high-quality ITO sputtering targets.In this paper,ITO nanopowders with uniform particle size and good dispersion were successfully synthesized in a microreactor using InCl_(3)·4H_(2)O,SnCl_(4)·5H_(2)O and ammonia as raw materials.The synthesized powder exhibited a specific surface area of 36.86 m^(2)/g and an average particle size of 22.75 nm.The effects of precursor concentrations,calcination temperature,and reaction temperature on the properties of the ITO powder were investigated,along with its ceramic sintering behavior at 1400-1580℃.Under sintering conditions at 1580℃ for 4 hours,an ITO ceramic with a relative density of 98.46%was achieved,possessing a resistivity of 3.532×10^(-4)Ω·cm and exhibiting a pore-free surface and cross-section.The research findings demonstrate that ITO powder particles synthesized via coprecipitation in a microreactor exhibit smaller particle sizes,uniform particle dimensions,and enhanced dispersion,owing to intense collisions and a uniform nucleation process within the microreactor channels.
分 类 号:TB34[一般工业技术—材料科学与工程]
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