退火温度对a-Si:C薄膜结构及摩擦学性能的影响  

Influence of Annealing Temperature on Structure and Tribological Properties of a-Si:C Films

作　　者：田卓颖 王林青 王军军[2] TIAN Zhuoying;WANG Linqing;WANG Junjun(School of Science,Chongqing University of Technology,Chongqing 400054,China;School of Materials Science and Engineering,Chongqing University of Technology,Chongqing 400054,China)

机构地区：[1]重庆理工大学理学院,重庆400054 [2]重庆理工大学材料科学与工程学院,重庆400054

出　　处：《摩擦学学报(中英文)》2025年第1期91-100,共10页Tribology

基　　金：国家自然科学基金项目(52475177);重庆市自然科学基金项目(CSTB2023NSCQ-MSX0439);重庆市永川区“揭榜挂帅”项目(2024yc-jbgs20004)资助。

摘　　要：以高纯SiC作为靶材,C_(2)H_(2)和Ar作为源气体,采用脉冲反应磁控溅射技术制备了a-Si:C薄膜,并对薄膜进行大气环境中不同温度退火处理(25~500℃),分析探索了退火温度对于a-Si:C薄膜形貌、微结构、力学性能和摩擦学行为的作用规律以及a-Si:C薄膜的摩擦磨损机理.研究发现:退火温度较低时(≤200℃),a-Si:C薄膜的结构几乎不变,硬度(H)和弹性模量(E)先增加后减小,内应力线性增加,相应地,薄膜的磨损率先减小后增加.此外,由于石墨化转移层的形成,薄膜的摩擦系数减小.在300℃下退火,薄膜的结构仍未发生明显变化,内应力、H和E稍微降低,摩擦系数稍微增加,磨损无显著变化;400和500℃退火后,薄膜发生了石墨化和氧化,结构出现明显变化,摩擦性能提高.分析表明,大气环境中不同温度退火后薄膜结构、力学性能的变化以及摩擦过程中转移层的形成保证了薄膜良好的摩擦学特性,相关结果为a-Si:C薄膜的结构性能调控和工程应用提供了参考.a-Si:C films as protective coating have been attracting more and more attentions due to prominent characteristic such as good thermal stability,excellent wear resistant and corrosion resistant.For the different sliding parts applications,a-Si:C films often subjected to localized heating caused by friction in ambient air.Thus,it is interesting to study these films'thermal stability and the mechanism of the low friction coefficient.Here,a-Si:C films were deposited by pulsed reactive magnetron sputtering in a gas mixture of Ar and C_(2)H_(2).The effects of annealing temperature(25~100 C)on morphology,microstructure,mechanical properties and tribological performance were studied.The result showed that as-deposited a-Si:C films displayed a typical amorphous structure and the cross-sectional morphologies of a-Si:C films were uniform and compact,and there were no obvious cracks.No indications of discontinuities were observed between the a-Si:C film and substrate/transition layer.After annealing at lower temperature(≤200℃),the structure of a-Si:C films had no significant change,but the internal stress lineally increased,and the maximum value was 2.8 GPa at 200 C.Hardness(H)and elastic modulus(E)firstly increased to 18.13 GPa and 167.74 GPa at 100℃from 4.14 GPa and 97.61 GPa at 25℃,respectively,and then decreased to 18.13 GPa and 167.74 GPa at 200℃.These parameters,in turn,determined the wear rate.Accordingly,the wear rate initially decreased and then increased.The films annealed at 100 C exhibited the lowest wear rate due to excellent mechanical properties where the maximum values of H/E and H/E’were obtained.The sample annealed at 200℃ exhibited the highest wear rate,possibly owing to its elevated internal stress.Moreover,the friction coefficient decreased due to the formation of graphitization transfer layer.At an annealing temperature of 300 C,the structure of films still remained the same,but the internal stress,H and E decreased slightly.Although the friction coefficient slightly increased due to surfa

关 键 词：非晶硅碳(a-Si:C)薄膜 退火温度 摩擦学性能 磁控溅射 

分 类 号：TH117.1[机械工程—机械设计及理论] TG156[金属学及工艺—热处理]