热处理温度对磁控溅射氧化钇薄膜形貌及物相的影响  

Effects of Heat Treatment Temperature on Morphology and Phase of Magnetron Sputtering Yttrium Oxide Film

作　　者：陈浩[1,2] 曹振亚 姜志忠 孙嘉隆[1,2] CHEN Hao;CAO Zhenya;JIANG Zhizhong;SUN Jialong(Institute of Nuclear Energy Safety Technology,Hefei Institutes of Physical Science,Chinese Academy of Sciences,Hefei 230031,China;Science Island Branch,Graduate School of USTC,Hefei 230026,China)

机构地区：[1]中国科学院合肥物质科学研究院核能安全技术研究所,安徽合肥230031 [2]中国科学技术大学研究生院科学岛分院,安徽合肥230026

出　　处：《热加工工艺》2025年第3期82-86,共5页Hot Working Technology

基　　金：国家磁约束核聚变能发展研究专项项目(2018YFE0312200)。

摘　　要：采用射频磁控溅射方法在短钨纤维表面制备Y_(2)O_(3)薄膜,薄膜厚度约100 nm。为便于研究,首先采用相同工艺将Y_(2)O_(3)薄膜沉积在钨片上,分别在500、700及900℃热处理1 h,通过扫描电镜、XRD射线衍射手段对薄膜表面形貌及物相变化分析,确定用于镀Y_(2)O_(3)薄膜短钨纤维的热处理温度。结果表明,700、900℃的薄膜均发生破损,而500℃热处理后的薄膜表面完整,相比于未热处理薄膜,结晶度提高。在此基础上,对镀Y_(2)O_(3)薄膜短钨纤维进行500℃热处理,最终在短钨纤维表面制备出了均匀完整、结晶度良好的Y_(2)O_(3)薄膜,为后续Wf/W复合材料制备奠定了工艺基础。Y_(2)O_(3) film was prepared on the surface of short tungsten fibers by radio frequency magnetron sputtering.The film thickness is about 100 nm.For convenience of study,firstly,the Y_(2)O_(3) film was deposited on the tungsten sheets by the same process,and it was heat-treated at 500℃,700℃and 900℃for 1 h,respectively,the surface morphology and phase of the film were analyzed by SEM and XRD,and the heat treatment temperature of short tungsten fiber coated with Y_(2)O_(3) film was determined.The results show that the films at 700℃and 900℃are all damaged,while the surface of the film is intact after heat treatment at 500℃,and the crystallinity of the film is improved compared with that of the unheat-treated film.On this basis,the short tungsten fiber coated with Y_(2)O_(3) film is heat-treated at 500℃,finally,Y_(2)O_(3) film with uniformity,integrity and good crystallinity is prepared on the surface of short tungsten fibers,which can lay a technological foundation for the subsequent preparation of Wf/W composites.

关 键 词：短钨纤维 磁控溅射 Y_(2)O_(3)薄膜 热处理 

分 类 号：TG156.1[金属学及工艺—热处理]