六甲基二硅氮烷电子级精馏纯化仿真模拟  

Simulation of Electronic Distillation Purification of Hexamethyldisilazane

作　　者：刘周恩[1] 崔艳红[2] 田啸宇 LIU Zhouen;CUI Yanhong;TIAN Xiaoyu(Institute of Processing Engineering,Chinese Academy of Sciences,Beijing 100191,China;Beijing Titan Instruments Co.,Ltd.,Beijing 100015,China;College of Chemical Engineering,Nanjing Tech University,Nanjing 211816,China)

机构地区：[1]中国科学院过程工程研究所,北京100191 [2]北京吉天仪器有限公司,北京100015 [3]南京工业大学化工学院,南京211816

出　　处：《有机硅材料》2025年第2期17-24,32,共9页Silicone Material

摘　　要：为满足电子信息产业对电子级六甲基二硅氮烷(HMDS)的高纯度(≥4N)要求,必须有效脱除其中的六甲基二硅氧烷(MM)和三甲基硅醇(TMSO)等杂质。本文提出利用精馏纯化技术来获取高纯度HMDS,并利用仿真模拟研究了HMDS分别与MM和TMSO组成的二元物系的气液相平衡关系,以及在不同压力下精馏时所需精馏塔理论板数(N_(DT))和回流比(R)等基础参数,同时进一步探讨了N_(DT)、进料位置(PF)、R、塔顶产物与原料中杂质总量比(r_(D))和精馏塔顶压力(P_(T))等对HMDS纯化效果的影响。结果表明:HMDS分别与MM和TMSO组成的二元物系,其气液相平衡关系均与理想液体的气液相平衡关系一致,不会形成难分离的共沸物;精馏时所需最少理论板数不少于23 pcs,最小回流比不小于5.98;通过优化N_(DT)、PF、R、r_(D)及P_(T)等参数,可有效脱除HMDS原料中的MM和TMSO杂质,使HMDS纯度达到4N。In order to meet the requirements of electronic industry for high purity(≥4N)of electronic hexamethyldisilazane(HMDS),impurities such as hexamethyldisiloxane(MM)and trimethylsilanol(TMSO)must be completely removed.High purity HMDS was obtained using distillation purification technology,and the vapor-liquid equilibrium relationship between HMDS and binary systems composed of MM and TMSO was studied using simulation.Basic parameters such as the theoretical plate number(N_(DT))and reflux ratio(R)required for distillation at different pressures were also investigated.Furthermore,it explored the effects of N_(DT),feed position(PF),R,ratio of impurities in the tower top product to the total impurities in the feed(r_(D)),and distillation column top pressure(P_(T))on the purification efficiency of HMDS.The results show that the binary systems composed of HMDS,MM and TMSO exhibit a vapor-liquid equilibrium relationships consistent with those of ideal liquid,and do not form difficult-to-separate azeotrope.The minimum theoretical number of plates required for distillation is not less than 23 pcs,and the minimum reflux ratio is not less than 5.98.By optimizing parameters such as N_(DT),PF,R,r_(D)and P_(T),MM and TMSO impurities in HMDS raw material can be effectively removed,resulting in a purity of 4N for HMDS.

关 键 词：六甲基二硅氮烷 电子级 纯化 精馏 仿真模拟 

分 类 号：TQ127.2[化学工程—无机化工] TQ028.31