Recent advances of photolithography patterning of quantum dots for micro-display applications  

作　　者：Xuemin Kong Xiaotong Fan Yuhui Wang Yunshu Luo Yihang Chen Tingzhu Wu Zhong Chen Yue Lin Shuli Wang 

机构地区：[1]Fujian Engineering Research Center for Solid-State Lighting,Department of Electronic Science,School of Electronic Science and Engineering,Xiamen University,Xiamen,361005,China [2]State Key Laboratory of Physical Chemistry of Solid Surface,Xiamen University,Xiamen,361005,China [3]Innovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province(IKKEM),Xiamen,361102,China

出　　处：《Nano Materials Science》2025年第1期49-64,共16页纳米材料科学(英文版)

基　　金：supported by the National Natural Science Foundation of China(62374142,12175189 and 11904302);External Cooperation Program of Fujian(2022I0004);Fundamental Research Funds for the Central Universities(20720190005 and 20720220085);Major Science and Technology Project of Xiamen in China(3502Z20191015).

摘　　要：The preparation of red,green,and blue quantum dot(QD)pixelated arrays with high precision,resolution,and brightness poses a significant challenge on the development of advanced micro-displays for virtual,augmented,and mixed reality applications.Alongside the controlled synthesis of high-performance QDs,a reliable QD patterning technology is crucial in overcoming this challenge.Among the various methods available,photolithography-based patterning technologies show great potentials in producing ultra-fine QD patterns at micron scale.This review article presents the recent advancements in the field of QD patterning using photolithography techniques and explores their applications in micro-display technology.Firstly,we discuss QD patterning through photolithography techniques employing photoresist(PR),which falls into two categories:PRassisted photolithography and photolithography of QDPR.Subsequently,direct photolithography techniques based on photo-induced crosslinking of photosensitive groups and photo-induced ligand cleavage mechanisms are thoroughly reviewed.Meanwhile,we assess the performance of QD arrays fabricated using these photolithography techniques and their integration into QD light emitting diode display devices as well as color conversionbased micro light emitting diode display devices.Lastly,we summarize the most recent developments in this field and outline future prospects.

关 键 词：Quantum dot PHOTOLITHOGRAPHY Patterning technology Micro-display 

分 类 号：O469[理学—凝聚态物理]