专利引证视角下技术轨道演化及核心技术识别——以“卡脖子”技术浸没式ArF光刻胶为例  

Research on technology trajectories evolution and critical technologies identification from patent citations:taking immersion ArF photoresist industry as an example

作　　者：许思娴 XU Sixian(Nanjing Tech University,Nanjing 210009,China)

机构地区：[1]南京工业大学,江苏南京210009

出　　处：《江苏科技信息》2025年第7期55-59,66,共6页Jiangsu Science and Technology Information

基　　金：江苏高校哲学社会科学研究项目一般项目,项目名称:基于主路径分析的专利技术轨道动态演化及核心技术识别研究,项目编号:2022SJYB0223;江苏省科技资源(工程技术文献)统筹服务平台自主研究课题,项目名称:高端半导体光刻胶领域核心技术识别研究;项目编号:TC2023C004。

摘　　要：专利是反映技术创新的重要手段,专利引证关系能够客观反映技术的关联发展,帮助挖掘技术轨道的动态演变。文章以“卡脖子”技术浸没式ArF光刻胶技术为研究对象,根据专利族之间的引证数据构建浸没式ArF光刻胶技术引文网络进行网络特征和参数分析,基于主路径分析确定浸没式ArF光刻胶的技术轨道演化,并利用中心度算法识别出浸没式ArF光刻胶技术领域中的核心技术和重点企业。研究结果表明:浸没式ArF光刻胶技术的演化发展呈现出单一趋势,路径依赖性强,且日本实现了技术垄断,现有可行改良方向主要在成膜树脂、顶部涂层、大分子疏水性光致产酸剂和光可分解碱。本研究对于测度“卡脖子”领域的技术发展潜能、推动“卡脖子”技术突破具有一定启示。Patents are an important means of reflecting technological innovation,and patent citation relationships can objectively reflect the related development of technology,helping to explore the dynamic evolution of technological trajectories.The article takes the“bottleneck”technology immersion ArF photoresist technology as the research object,constructs a citation network for immersion ArF photoresist technology based on citation data between patent families for network feature and parameter analysis,determines the technological trajectory evolution of immersion ArF photoresist based on main path analysis,and uses centrality algorithm to identify core technologies and key enterprises in the field of immersion ArF photoresist technology.The research results indicate that the evolution and development of immersion ArF photoresist technology presents a single trend,with strong path dependence,and Japan has achieved technological monopoly.The existing feasible improvement directions mainly include film-forming resins,top coatings,large molecule hydrophobic photo acid generators,and photo degradable bases.This study has certain implications for measuring the technological development potential in the field of“bottleneck”and promoting breakthroughs in“bottleneck”technology.

关 键 词：专利引证网络 技术轨道 技术主路径 光刻胶 

分 类 号：G306[文化科学]