化学机械抛光中复合氧化铈磨料的研究进展  

Advances in composite cerium oxide abrasives in chemical mechanical polishing

作　　者：曾强 佟志芳 华璞杰[1,2] ZENG Qiang;TONG Zhifang;HUA Pujie(Jiangxi Provincial Key Laboratory of High-Performance Steel and Iron Alloy Materials,Ganzhou 341000,China;School of Metallurgical Engineering,Jiangxi University of Science and Technology,Ganzhou 341000,China)

机构地区：[1]高性能钢铁合金材料江西省重点实验室,赣州341000 [2]江西理工大学冶金工程学院,赣州341000

出　　处：《江西冶金》2025年第2期122-132,共11页Jiangxi Metallurgy

基　　金：国家自然科学基金项目(52064019)。

摘　　要：本文综述了近年来复合纳米氧化铈(CeO_(2))磨料在化学机械抛光(CMP)领域的最新研究进展,总结了CeO_(2)复合磨料在结构组成及化学掺杂等方面对抛光性能的影响,阐述了不同种类CeO_(2)复合抛光粉的作用机理,认为具有良好抛光性能的CeO_(2)抛光磨料通常是通过核-壳结构或金属元素掺杂的形式进行优化。在不同的抛光工艺和抛光要求下,这两种形式都可有效提升CeO_(2)磨料抛光的速率和平坦度。最后对复合CeO_(2)抛光磨料领域存在的主要技术问题进行了总结,提出了改进措施,并对其发展前景进行了展望,复合CeO_(2)抛光粉未来将逐渐向定制化、可控化、功能化方向发展。The latest research progress of composite cerium oxide nano-abrasives in the field of chemical mechanical polishing(CMP)in recent years is reviewed,and the effects of cerium oxide composite abrasives on the polishing performance in terms of structural composition and chemical doping are summarized,and the mechanism of the action of different kinds of cerium oxide composite polishing powders is elaborated.It is believed that cerium oxide polishing abrasives with good polishing performance are usually optimized in the form of core-shell structure or metal element doping.Both forms can effectively enhance the rate and flatness of cerium oxide polishing abrasives under different polishing processes and polishing requirements.Finally,the main scientific and technological problems in the field of composite cerium oxide polishing abrasives are summarized,future improvement measures are proposed,and its future development is expected,and the future composite cerium oxide polishing powder will gradually develop towards customization,controllability and functionalization.

关 键 词：氧化铈 复合磨料 化学机械抛光 结构优化 

分 类 号：TF125[冶金工程—粉末冶金]