HiPIMS溅射AlCrN涂层结构对抗铝黏着性能的影响  

Effect of HiPIMS Sputtered AlCrN Coating Structures on Anti-aluminum Adhesion Properties

作　　者：秦亚东 高方圆[1,3] 许亿 夏原 QIN Yadong;GAO Fanyuan;XU Yi;XIA Yuan(Wide Range Flight Engineering Science and Application Center,Institute of Mechanics,Chinese Academy of Sciences,Beijing 100190,China;School of Engineering Science,University of Chinese Academy of Science,Beijing 100049,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院力学研究所宽域飞行工程科学与应用中心,北京100190 [2]中国科学院大学工程科学学院,北京100049 [3]中国科学院大学材料科学与光电工程中心,北京100049

出　　处：《中国表面工程》2025年第1期216-227,共12页China Surface Engineering

基　　金：国家重点研发计划(022YFB3404203);吉林省、长春市重大科技专项(20210301017GX)。

摘　　要：一体化压铸模具在汽车产业轻量化和节能环保政策的背景下应时而生,在服役过程中受到高温、高速铝液冷热交替作用,传统的表面处理技术不能满足如此苛刻的服役条件,采用Hi PIMS技术制备Al Cr N涂层是提升一体化压铸模具表面抗铝黏着性能的重要措施之一。基于等离子体发射光谱(OES),采用高能脉冲磁控溅射(Hi PIMS)技术在不同的N_(2)/Ar流量比下制备具有致密结构的高性能AlCrN涂层。利用数字示波器、高压探针、电流探针和等离子体发射监测器开展Hi PIMS放电特征和时间平均的OES光谱研究,采用X射线衍射仪和扫描电镜分析涂层的晶相结构、晶粒尺寸及表面截面形貌,采用纳米压痕仪测试薄膜的纳米硬度和弹性模量。设计进行抗铝黏着测试来观测涂层在铝液中的行为。结果表明,随着N_(2)/Ar流量比的增加,Hi PIMS下的峰值电流随之升高,峰值功率密度也随之升高;沉积速率先增大后降低;涂层的晶粒尺寸和微观结构也会出现明显变化;成膜环境出现大量的离子态,CrⅡ、AlⅡ、NⅡ的强度明显提升,且CrⅡ/CrⅠ强度上升,说明离化率也会随之上升;涂层结构随着N_(2)/Ar流量的变化主要呈现三种状态:非晶结构、hcp-AlN与fcc-AlCrN混合相、单一fcc-AlCrN相,实验中涂层氮含量始终保持较高水平且随着N_(2)/Ar流量比整体呈上升趋势,并最终在fcc-AlCrN结构中接近化学计量组成;在最高的N_(2)/Ar流量下制备出择优取向为(220)的fcc-AlCrN相涂层,具有最高的硬度和弹性模量,同时有着最高的H/E与H^(3)/E^(2)比值。在抗铝黏着测试中此结构也表现出无铝黏附的良好特性,且涂层相结构和成分均无明显变化,fcc-AlCrN结构在铝液中的稳定性是表现优异出抗铝黏着性能的关键。通过改变N_(2)/Ar流量比制备出高性能AlCrN涂层,给出提升一体化压铸模具表面抗铝黏着性能的可能性。Integrated die-casting molds have emerged in response to lightweight,energy-saving,and environmental protection policies in the automotive industry.These molds are subjected to the alternating effects of high-temperature and high-speed aluminum liquid cooling and heating,and traditional surface treatment technologies cannot meet these harsh service conditions.The coating prepared by high-energy pulsed magnetron sputtering(HiPIMS)is dense,smooth,and exhibits good mechanical properties.The preparation of the AlCrN coating using HiPIMS technology is an important measure for improving the aluminum adhesion resistance of integrated die-casting dies.Based on plasma emission spectroscopy(OES),HiPIMS technology was used to prepare high-performance AlCrN coatings with a dense structure at various N2/Ar flow ratios.The discharge characteristics and time-averaged OES spectra of HiPIMS were examined using a digital oscilloscope,high-voltage probe,current probe,and plasma emission monitor.The crystal phase structure,grain size,and surface cross-sectional morphology of the coating were analyzed using an X-ray diffractometer and scanning electron microscope.The nano-hardness and elastic modulus of the film were measured using a nano-indentation instrument.An anti-adhesion test with liquid aluminum was designed to assess the performance of the coating structure at 700°C.The results showed that as the N2/Ar flow ratios increased,the peak current under HiPIMS and peak power density also increased.The deposition rate first increased and then decreased,and the grain size and microstructure of the coating changed significantly.Numerous ionic states appeared in the film-forming environment,and the strength of CrII,AlII,and NII increased significantly.As the strength of CrII/CrI increased,the ionization rate of metal atoms in the target also increased with the N2/Ar flow ratio during sputtering.With the change in the N2/Ar flow rate,the coating structure primarily exhibited three states:an amorphous structure,a hcp-AlN and fcc-AlCrN m

关 键 词：HIPIMS AlCrN涂层 氮氩流量比 光学发射光谱 铝液腐蚀 

分 类 号：TG156[金属学及工艺—热处理] TB114[金属学及工艺—金属学]