制备工艺对WO_3/TiO_2薄膜可见光催化活性的影响  

Effect of preparation process of WO_3/TiO_2 films on photo-catalytic activity under visible light

作　　者：张琦[1] 李新军[1] 李芳柏[2] 王良焱[1] 梁园园[1] 

机构地区：[1]中国科学院广州能源研究所,广州510070 [2]广东省生态环境与土壤研究所,广州510650

出　　处：《中国有色金属学报》2002年第6期1299-1303,共5页The Chinese Journal of Nonferrous Metals

基　　金：广东省自然科学基金资助项目 ( 0 10 873) ;广东省科技计划项目(A30 40 30 1)

摘　　要：采用磁控溅射技术在浸渍提拉法制得的TiO2 薄膜上溅射WO3 层 ,通过不同制备工艺控制W在TiO2晶体中的分布。UV VIS透射光谱表明 ,在可见光范围内溅射有WO3 层的薄膜有不同程度的吸收光谱红移现象。并理论计算出带隙能 ,溅射WO3 层使薄膜的带隙能变小。甲基橙光催化降解实验表明 ,以焙烧—溅射—热处理 5h工艺制备的WO3 /TiO2 薄膜可见光活性最佳 ,W从薄膜表面到内层的浓度递减分布。讨论了不同制备工艺引起的W在薄膜内部的不同分布对光催化活性的影响。The TiO 2 thin films from dip-coating system were magnetron-sputtered with WO 3, in which different tungsten distribution was controlled by different preparation process. On the basis of UV-VIS transmissive spectra, the sputtered films have absorption peaks toward longer wavelength, and the calculation illustrates the lower optical band gap. The photo-oxidation of orange methyl proves that the process of baking-magnetron sputtering-heat treatment for 5 h produces WO 3/TiO 2 film with best visible-light activity. The distribution of tungsten across the film section is decreased from surface to bottom. The effect of tungsten distribution on the photocatalytic activity was discussed.

关 键 词：制备工艺 WO3/TiO2薄膜 可见光催化活性 二氧化钛 磁控溅射 氧化钨 半导体 

分 类 号：O643.361[理学—物理化学] TN3[理学—化学]