具有可见光活性的TiO_2薄膜的制备及光催化性能  

Preparation of TiO_2 film with visible-light activity and photocatalytic prope rties

作　　者：张琦[1] 王良焱[1] 李新军[1] 李芳柏[2] 何明兴[3] 梁园园[1] 

机构地区：[1]中科院广州能源研究所,广州510070 [2]广东省生态环境与土壤研究所,广州510460 [3]四川攀枝花钢铁集团公司钢铁研究院,攀枝花617000

出　　处：《功能材料与器件学报》2002年第4期397-401,共5页Journal of Functional Materials and Devices

基　　金：广东省自然科学基金(010873);广东省科技计划项目(A3040301)

摘　　要：运用磁控溅射技术在浸渍-提拉法制得的TiO2薄膜上溅射三氧化钨层得到光催化薄膜。采用SEM、XRD、AES、UV-vis漫反射光谱等方法表征催化剂薄膜的厚度、晶相结构、化学元素组成及光吸收性能。以甲基橙的光催化降解为反应模型,高压汞灯为光源,溅射有三氧化钨薄膜的光催化活性低于纯TiO2薄膜;滤过紫外光后,溅射有三氧化钨的薄膜光催化活性明显高于纯TiO2薄膜。本实验提供了一种制备高可见光活性的TiO2薄膜的方法。TiO2 films made from dip-coating system were modified by the magnetr on sputtering of WO3.The thickness, phase, chemical composition and the optical absorption of the f ilms were characterizedby means of SEM, XRD, AES, UV-vis reflectance spectra techniques. With irradi ation of high-pressure mercury lamp, the photo-catalytic behavior of film magnetron sputter ed with WO3 is weakenedin the degradation of orange methyl, while with the addition of UV light filte r, the photo-catalytic behavior is enhanced. A preparation method of TiO2 film with high visible ligh t activity is proposed.

关 键 词：制备 光催化性能 薄膜 可见光活性 二氧化钛 磁控溅射 氧化钨 

分 类 号：TQ134.11[化学工程—无机化工]