RAMAN谱研究在退火和镍衬底上金刚石形核中甲烷的影响(英文)  

Micro-Raman Study the Effect of CH 4 for Annealing and Diamond Nucleation on Ni Substrate

作　　者：费允杰[1] 王学进[1] 熊艳云[1] 冯克安[1] 

机构地区：[1]中国科学院物理研究所,北京100080

出　　处：《光散射学报》2002年第4期190-197,共8页The Journal of Light Scattering

基　　金：国家自然科学基金资助 (编号 :5 0 0 72 0 45 )

摘　　要：藉助SEM和MICRO RAMAN ,我们研究了在退火和在镍衬底上金刚石形核中甲烷CH4 的影响。CH4 的浓度分别为 0 % ,0 5 % ,1 5 %和 2 5 % ,其中当甲烷浓度为 1 5 %时 ,金刚石在镍衬底上金刚石形核密度为 3× 1 0 8/cm2 ,这个结果高于以前的结果。金刚石膜的质量是好的。The effect of CH 4 for density and quality of diamond nuclei on nickel substrates are studied by SEM and Micro-Raman in the high-temperature annealing process. If we change the concentration of CH 4:0.5%,1.5% and 2.5%, the quality of diamond nuclei will be improved, in which the 1.5% CH 4 concentration is found to be best fit for diamond to nucleate 3×108/cm2 on nickel substrates. the density of diamond nuclei is higher than the density of nuclei on nickel substrates in previous works and the quality of diamond is good.

关 键 词：RAMAN谱 退火 镍衬底 甲烷 金刚石薄膜 成核 CVD 化学气相沉积 

分 类 号：TN304.18[电子电信—物理电子学] O48[理学—固体物理]