IC工艺用超纯水系统的TOC实验研究  

TOC experiments on ultrapure water system for IC fabrication

作　　者：王铁坤[1] 华卫群[1] 

机构地区：[1]无锡微电子科研中心,江苏无锡214035

出　　处：《微纳电子技术》2003年第3期33-38,共6页Micronanoelectronic Technology

摘　　要：从运行管理角度,以实验方法考察了IC工艺用超纯水制造过程中TOC(总有机碳)的若干问题。通过在线测量一次纯水、二次纯水的TOC含量和相应的数据统计,评估了水平各异的两套超纯水制造系统中各主要装置对TOC的除去效率及其对TOC的影响。Experiments have been made to investigate the control of TOG (total organic carbon) in ultrapure water for IC fabrication from the point of view of production managements. Through the data statistics of the on-line TOG content measurements of 1st and 2nd pure water, the effect of the key equipment in two different ultrapure water production systems for removal of TOG is evaluated.

关 键 词：IC工艺 超纯水 TOC 一次纯水 二次纯水 膜脱气 总有机碳 

分 类 号：TN405[电子电信—微电子学与固体电子学] TN305.97