用于IC氧化层和氧化炉管在线监控的表面光电压技术  

The Application of Surface Photovoltage Technology in Monitoring Gate Oxide and Oxidation Furnace System

作　　者：李清华 刘键[2] 罗俊一 李晴[2] 郑国祥[2] 

机构地区：[1]上海先进半导体公司,200233 [2]复旦大学材料科学系,上海200433

出　　处：《固体电子学研究与进展》2003年第1期120-125,共6页Research & Progress of SSE

摘　　要：表面光电压法 (SPV)是一种高灵敏度的、非破坏性的在线监控技术。能精确测量硅片的少子扩散长度、少子寿命、重金属沾污浓度等参数。对 IC生产的质量保证是非常重要的检测手段。文中介绍了用于监控 IC生产栅氧化层和氧化炉管系统的 SPV技术 ,并讨论了铁以外其它沾污的 SPV检测。The Surface Photovoltage (SPV) method, which can be used to detect the minority carrier diffusion length,lifetime, and heavy metal contamination level accurately, is an effective technique of high sensibility and no destruction to monitor the characteristics of the wafer in line and is also an effective method to exam the quality of devices in IC manufacturing.We adopted the SPV method to monitor the gate oxide and the oxidation furnace system and discussed the examination for other contamination detected by this method in this paper.

关 键 词：表面光电压 金属沾污 在线监控 SPV 集成电路 氧化层 氧化炉管 

分 类 号：TN406[电子电信—微电子学与固体电子学]