刻蚀衍射光栅色散特性分析  

Analysis of the Chromatic Dispersion Characteristics for an Etched Diffraction Grating

作　　者：宋军[1] 何赛灵[1] 何建军[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,光及电磁波研究中心杭州310027

出　　处：《光子学报》2003年第3期318-322,共5页Acta Photonica Sinica

基　　金：浙江省科技计划重大项目 (项目编号 0 0 110 10 2 7)资助

摘　　要：对作为波分复用关键器件之一的刻蚀衍射光栅 (EDG)的色散特性提出了一种完整的计算方案 ,分析了器件强度响应和相位响应之间的内在关系 .同时通过模拟计算提出并验证了平坦化的同时加剧了色散 ,以及适当改善频谱响应带通纹波大小可以在一定程度上降低器件的色散 .最终指出了使用渐变的抛物线结构多模干涉更有利于得到综合性能最优的平坦频谱 .A method for calculating the chromatic dispersion of an etched diffraction grating (EDG) demultiplexer is presented in detail. It is shown that the chromatic dispersion characteristics will be deteriorated when a fat-top pass-band of the spectral amplitude response is improved. The chromatic dispersion can be reduced to some extent by reducing the ripple in the amplitude response. The intrinsic relation between the amplitude and phase of the spectral response is analyzed and simulated. It is shown that as an input waveguide structure of a DWDM device a parabola multimode interference can achieve better flat-top and less chromatic dispersion than a conventional MMI structure.

关 键 词：色散 刻蚀衍射光栅(EDG) 波分复用 平坦化 相位响应 带通纹波 

分 类 号：TN256[电子电信—物理电子学]