铜基受电弓滑板试件电阻率和磨损性能研究  被引量:26

Resistivity and abrasion performance of copper matrix pantograph slider samples

在线阅读下载全文

作  者:金永平[1] 郭斌[1] 郑艾龙[1] 周健[1] 

机构地区:[1]哈尔滨工业大学材料科学与工程学院,黑龙江哈尔滨150001

出  处:《哈尔滨工业大学学报》2003年第4期441-446,共6页Journal of Harbin Institute of Technology

基  金:哈尔滨市科技攻关资助项目 (0 1112 1110 4)

摘  要:为了制备具有优良电阻率和磨损性能的C/Cu复合材料 ,运用传统的粉末冶金 (PM)方法 ,首次将受电弓滑板材料中C的质量分数提高到 8% (采用大粒度石墨的粒度为 5 0目和 32目 ) ,分析了压制压力、烧结保温时间和烧结温度对其电阻率和磨损性能的影响 .研究了石墨粒度和镀铜石墨对受电弓滑板材料性能的影响 .研究结果表明 :如果增大压制压力 ,电阻率下降 ;而延长烧结保温时间和提高烧结温度 ,使材料的电阻率增加 .烧结温度过高或过低对材料的耐磨性和减摩性不利 .石墨粒度越大 ,电阻率越小 ,减摩性和耐磨性越差 .镀铜石墨能够改善铜基受电弓滑板材料的烧结过程 ,降低其孔隙度和电阻率 ,提高其耐磨性和减摩性 。In order to prepare C/Cu composites with excellent resistivity and abrasion performance, The mass fraction of C in pantograph slider samples was raised to 8% for and 32 eyes using traditional powder metallurgy(PM) method the first time with large granularity graphite of 50 eyes and 32 eyes. The influences of pressing pressure, sintering heat preservation time and sintering temperature on its resistivity and abrasion performance were analyzed. The results show that its resistivity decreased with the increase of pressure. Its resistivity increases as sintering heat preservation time and sintering temperature increase. Too high or too low sintering temperature is harmful to its abrasivity and antifriction. Effects of graphite granularity and copper-coated graphite on its performance were also investigated. The larger the granularity of graphite is, the smaller resistivity is, and the worse abrasivity and antifriction are. Copper-coated graphite can improve the sintering process of copper matrix pantograph slide plate, decrease its porosity and resistivity, and increase its wearability and antifriction, but doesn't change its abrasion mechanism.

关 键 词:铜基复合材料 受电弓滑板 电阻率 磨损性能 粉末冶金 镀铜石墨 石墨粒度 冷压烧结 电力机车 

分 类 号:U264.34[机械工程—车辆工程] TB331[交通运输工程—载运工具运用工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象