三束同步混合注入装置的研制、调试与初步应用  

DEVELOPMENT ADJUSTMENT AND PRELIMINARY APPLICATION OF A THREE-BEAM SYNCHRONOUSLY MIXED IMPLANTER

作　　者：刘明哲[1] 钟溥[1] 邢大中 卢大伦 高玉[1] 马腾才[2] 张国炳[2] 龙振湖[2] 史维东[2] 宫泽祥[2] 

机构地区：[1]核工业西南物理研究院 [2]大连理工大学

出　　处：《核聚变与等离子体物理》1992年第4期238-244,251,共8页Nuclear Fusion and Plasma Physics

摘　　要：本文扼要地介绍了三束同步混合注入装置,给出离子束源、原子束源和电子束源的设计和调试结果,还给出三束动态混合调试结果及初步开展的动态混合离子注入工艺开发与应用情况。三束同步处理和电子束的活化作用是该装置的主要特点。In this paper, a three beam synchronously mixed implanter is briefly described. The design and adjustment results of the ion, atom and electron beam sources are given. The results of dynamic mixing adjustment of the three beams are presented and preliminary development and applications of the dynamic mixed ion implantation process are introduced as well. Three-beam synchronous treatment and activation by electron beam are the main features of this device.

关 键 词：离子源 离子注入 注入系统 表面 

分 类 号：TG174.44[金属学及工艺—金属表面处理]