不同基材上电子束原子束结合沉积NiCoCrAlY的高温氧化研究  

High Temperature Oxidation Behaviour of NiCoCrAlY Films Deposited with Electron-Atom Beams Combination Processing On Different Substrate Materials

作　　者：黄宁康[1] 汪德志[1] 冯志蓉[1] 熊兆奎[1] 王培录[1] 

机构地区：[1]四川大学,成都610064

出　　处：《机械工程材料》1992年第5期16-19,31,共5页Materials For Mechanical Engineering

基　　金：国家863计划资助项目

摘　　要：在不同的铁基合金GH140、1Cr18Ni9Ti、A3基材上采用电子束原子束结合技术进行了NiCoCrAlY膜的沉积,并进行了1000℃、10 h的等温氧化试验,通过试样高温氧化前后的电子形貌、EDAX组分测量以及XRD物相分析表明,沉积膜与基材发生了不同程度的混合,有害杂质进入涂膜大大影响了涂层的抗氧化性能。基材本身的抗高温氧化能力也影响了涂膜的高温氧化行为。NiCoCrAlY films were deposited by electron-atom beams combination processing on the different substrate materials: GH140, 1 Cr18 Ni 9 Ti and A_3 steels. Oxidation tests were carried out at 1000℃ for 10 h. The results with the analyses of morphology, EDAX and XRD measured before and after high temperature oxidation Showed that the films were mixed with the substrate and harmful impurities were introduced into the films, and it affected greatly the properties of the deposited films in high temperature oxidation.

关 键 词：电子束 原子束 结合沉积 高温氧化 

分 类 号：TG13[一般工业技术—材料科学与工程]