准分子激光光刻的发展状况  

Deveiopment on excimer laser lithography

作　　者：田文彦[1] 曾传湘 潘大任[1] 周业为[1] 

机构地区：[1]四川大学

出　　处：《激光杂志》1992年第3期113-116,共4页Laser Journal

摘　　要：本文综述了准分子激光光刻的发展,着重讨论准分子激光光刻的优点及其在提高分辨率方面的进展,并讨论了今后的动向。The developments of excimer laser lithography have been reviewed, the emphasis of discussion is placed on the advantage of excimer laser lithography, the development on resolution increase and the glorious future has been discussed as well.

关 键 词：准分子激光 光刻 集成电路 激光 

分 类 号：TN405.7[电子电信—微电子学与固体电子学]