气体脉冲放电等离子体阻抗的参量研究  

Parametric study of plasma resistance in gas pulsed discharges

作　　者：陈钢[1] 潘佰良[1] 姚志欣[1] 

机构地区：[1]浙江大学物理系,杭州310027

出　　处：《物理学报》2003年第7期1635-1639,共5页Acta Physica Sinica

基　　金：国家自然科学基金 (批准号 :10 0 0 40 0 8和 199740 3 7)资助的课题~~

摘　　要：在纯净氦气条件下 ,对高频纵向脉冲放电的等离子体动态阻抗进行了实验研究 .测量了放电等离子体阻抗随放电电压、频率以及气体压强之间的变化关系 ,表明等离子体阻抗随频率和电压的增加而下降 ,随气压的升高而增大 .定性分析了这些宏观参量与等离子体阻抗变化之间的关系 ,拟合出等离子体阻抗随电压、频率、气压变化的经验公式 ,并对数值模拟与实验结果进行了比较研究 .The dependences of dynamic plasma resistances on discharge voltage, repetitive frequency and buffer gas pressure are studied and measured. It is found that the plasma resistance reduced with the increase of discharge voltage and repetitive frequency, but increased with enhancing buffer gas pressure. The experimental formula of plasma resistance depending on discharge voltage, repetitive frequency and buffer gas pressure was proposed and the pulsed discharge current was simulated using the experimental formula of plasma resistance.

关 键 词：等离子体阻抗 气体脉冲放电 参量 气体压强 频率 电压 气体激光器 

分 类 号：O536[理学—等离子体物理]