消像差光栅的理论及实验研究  

Theory, design, manufacture and measurement of aberration reducing gratings

作　　者：朱向冰[1] 付绍军[1] 叶为全[1] 何世平[2] 刘颖[1] 徐向东[1] 洪义麟[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室 [2]中国科学技术大学工程科学学院,安徽合肥230027

出　　处：《光学精密工程》2003年第4期354-358,共5页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.10272098)

摘　　要：对消像差光栅进行了理论和实验研究。用光程函数和费马原理研究光栅的成像,用刻槽分布函数表示光栅的刻槽曲率及间距变化。对成像的理论分析表明光栅刻槽分布函数比刻槽间距更容易表达像差,给出了消像差光栅的表达形式。比较了SD、WFA、LPF等光栅的参数优化方法。探讨了消像差光栅密度的干涉测量法,设计了光路,对光栅密度进行了测量。Fermat's principle and light path functions were used to analyze the aberration of gratings. The groove pattern function was employed to express the curvature and groove space of aberration reducing gratings, and the dispersive system containing a single grating was discussed. The groove pattern function contains more information about the imaging properties of the grating than groove space, and there is no need to project the grooves. Several expressions of aberration reducing gratings are given. The design manufacture and measurement of aberration reduced gratings are discussed. And the gratings measured by interference. 

关 键 词：消像差光栅 光程函数 费马原理 刻槽分布函数 成像 像差 实验研究 

分 类 号：TH741.6[机械工程—光学工程] O436[机械工程—仪器科学与技术]