光纤白光干涉法与膜厚纳米测量新技术研究  

Study of Nanometer Scale Thickness Testing Method of Film Based On The White-light Interferometry

作　　者：杨玉孝[1] 熊开利[1] 孙艳[1] 谭玉山[1] 

机构地区：[1]西安交通大学激光红外研究所,西安710049

出　　处：《光子学报》2003年第8期973-976,共4页Acta Photonica Sinica

基　　金：教育部"教育振兴行动计划";西安交通大学自然科学基金 (2 0 0 10 0 1)资助项目

摘　　要：运用薄膜光学干涉原理、光纤技术和干涉光谱分析技术 ,用光纤反射式干涉光谱仪(ReflectromicInterferenceSpectroscopy)直接测试宽带入射光在单晶硅表面超薄SiO2膜层前后界面反射形成的干涉光谱曲线 ,并用专业软件对被测光谱信号数据处理后 ,可直接用公式准确计算出SiO2氧化膜的厚度和光学折射率 通过对单晶硅片表面超薄SiO2氧化膜的实测 ,并与成熟的椭圆偏振仪测试结果相比 ,测试误差≤ 2nm 但该方法测试简单、快速 ,精度高 ,不需要制定仪器曲线和数表 ,可对薄膜任意位置的厚度在线测试 经过对不同厚度聚苯乙烯薄膜的厚度测试表明 ,该方法适合 0 .5～ 2 0 μm薄膜厚度的精确在线测量 ,测量误差小于 7nm .According to the theory of white-light interference spectrum analysis and optical fiber technology, using reflectromic interference spectroscopy setup made by our group, the thickness and its refractive index of SiO 2 film can be directly calculated by analyzing the spectrum formed between the two reflected light at two interface of the film with professional software. Comparing the testing results with ellipsometry method′s, the testing error is less than 2 nm. But, this method is fast and easy in operation, accurate. Using this method, the thickness and refractive index of film can be tested on line. The experimental testing results of SiO 2 film and polystyrene film show that the sensitivity of this method is from 0.5nm to 20 μm, test error is less than 7 nm.

关 键 词：反射式干涉光谱仪 薄膜 干涉 无损检测 

分 类 号：TH744.1[机械工程—光学工程]