全息片质量对原子全息光刻图形影响的模拟研究  

Simulation Study on Influence of Hologram Quality on Reconstructed Pattern in AHL

作　　者：石建平[1] 陈旭南[1] 陈献忠[1] 高洪涛[1] 陈元培[1] 秦涛[1] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室,成都610209

出　　处：《微细加工技术》2003年第3期26-30,共5页Microfabrication Technology

基　　金：中国科学院创新基金资助项目(A2K0009)

摘　　要：全息片质量是影响原子全息光刻再现图形质量的关键因素,然而其制作工艺复杂,工序繁多,质量难以控制,模拟研究有助于把握全息片制作工艺中的关键环节,提高全息片的质量。详细模拟了全息片的三个主要质量指标:刻透率、分辨力以及薄膜厚度对再现像质的影响,结果表明:刻透率控制在90%左右即可满足要求,分辨率应优于0.1μm,膜层应尽量均匀。The quality of hologram is the key factor influencing the reconstructed pattern's quality in the atom lithography technology. But the fabricating processes of the hologram are complicated and its quality is difficultly controlled. The simulation research is helpful for managing the keys in its fabricating processes and improving its quality. The effects of the three main indexes of the quality (i.e. the hollowed out ratio, hologram resolution and film thickness on the quality of the reconstructed pattern) are simulated. The results show that the hollowed out ratio of about 90% is required,the resolution should be betler than 0.1μm and the film thickness is as uniform as possible.

关 键 词：全息片质量 原子全息光刻 刻透率 分辨力 薄膜厚度 原子波包 全息再现 

分 类 号：TN305.7[电子电信—物理电子学]