溶胶法制备的二氧化硅与二氧化钛复合薄膜的性能  

Characteristics of SiO_2-TiO_2 Complex Thin Films Prepared by Sol Method

作　　者：任达森[1] 崔晓莉[1] 张群[1] 沃松涛[1] 杨锡良[1] 章壮健[1] 陆明[2] 

机构地区：[1]复旦大学材料科学系,上海200433 [2]复旦大学光科学与工程系,上海200433

出　　处：《物理化学学报》2003年第9期829-833,共5页Acta Physico-Chimica Sinica

摘　　要：在室温下,采用溶胶法在玻璃基板上制备了厚度约为100 nm的均匀、透明的纳米SiO_2-TiO_2复合薄膜.研究了不同温度处理后薄膜的超亲水性、光催化能力等光致活性.通过XPS对薄膜表面及近表面元素的化学态的研究发现,Ti在表面及近表面不仅以Ti^(4+)形式存在,也存在少量Ti^(3+).紫外光照射后,部分Ti^(4+)转变成了Ti^(3+).XRD研究表明,该薄膜中的IiO_2主要以锐钛矿形式存在,而且其晶粒大小为14～20 nm.用AFM研究了SiO_2-TiO_2薄膜的表面形貌及不同的温度处理对IiO_2颗粒大小的影响.Uniform and transparent nanoscale SiO2-TiO2 complex thin films with thickness of about 100 nm were prepared by sol method on glass substrates at room temperature in air. The photo-induced activity of the films has been measured. The effect of annealing on the hydrophilicity and the photocatalysis activity of the films were studied. The chemical states of the elements on the surface and near the surface were measured by XPS. The results show that the Ti in/on the surface of the films exists not only as Ti4+ but also as Ti3+. At the same time, part of the Ti4+ has been changed to Ti3+ after UV irradiation. The crystal structure of the TiO2 in the SiO2-TiO2 film is mainly anatase as shown by XRD and the crystal grain size is about 14 similar to 20 nm. The AFM was used to study the morphology of the films annealed at different temperatures.

关 键 词：溶胶法 制备 二氧化硅 二氧化钛 复合薄膜 性能 光致活性 表征 

分 类 号：O484.1[理学—固体物理]