电弧离子镀氧化铬涂层的组织结构及硬度  

MICROSTRUCTURE AND HARDNESS OF CHROMIUM OXIDE COATINGS BY ARC ION PLATING

作　　者：纪爱玲[1] 汪伟[1] 宋贵宏[1] 汪爱英[1] 孙超[1] 闻立时[1] 

机构地区：[1]中国科学院金属研究所,沈阳110016

出　　处：《金属学报》2003年第9期979-983,共5页Acta Metallurgica Sinica

摘　　要：采用电弧离子镀方法在不锈钢基体上沉积Cr2O3薄膜.研究了氧流量和脉冲偏压对薄膜相结构、沉积速率、表面形貌、薄膜硬度的影响.结果表明,氧流量和脉冲偏压对薄膜的相结构有较大的影响.在氧流量为130 cm3/s、脉冲偏压为-100V时,出现Cr2O3{001}面择优取向;氧流量增高,脉冲偏压增大时,薄膜的表面形貌得到改善;在脉冲偏压为-200 V、氧流量为130 cm3/s时,可获得符合Cr2O3化学计量比的薄膜,其硬度达到36 GPa.Chromium oxide thin film was deposited on stainless steel by arc ion plating (ATP). The effects of the flow rate of oxygen and pulse bias voltage on the structure, deposition rate and the surface morphology of thin film were studied. The microhardness of thin film was measured at different pulse bias voltage. The results show that the Cr2O3 film has {001} plane texture at the oxygen flow rate of 130 cm(3)/s and a bias voltage of -100 V. The higher the oxygen flow rate and bias voltage, the less the big particles in the thin film. Stoichiometric Cr2O3 thin film obtained at oxygen flow rate of 130 cm(3)/s and a bias voltage of -200 V has an optimal hardness value up to 36 GPa.

关 键 词：Cr2O3薄膜 电弧离子镀 组织结构 脉冲偏压 

分 类 号：TG174.44[金属学及工艺—金属表面处理] TG113.2[金属学及工艺—金属学]