可写光盘光密度曲线模型的研究及应用  

Study and application of optical density curve model for recordabl e disc

作　　者：岳宏达[1] 潘龙法[1] 

机构地区：[1]清华大学精密仪器与机械学系光信息存储国家工程研究中心,北京100084

出　　处：《光学技术》2003年第5期549-551,554,共4页Optical Technique

基　　金：国家"九七三"重点基础研究项目(G19990330)

摘　　要：利用光密度曲线模型优化可写光盘的染料旋涂工艺。模型具有4个特征点和3个特征线段。特征点的位置反映了平移效应和填充效应的综合效果。特征线段的斜率反映了薄膜表面的平面度。借助模型分析旋涂工艺中的许多重要参数,从而控制盘片质量,并最终实现闭环生产控制。An optical density curve model for optimizing the dye coating process of recordable disc is introduced. This model has 4 characteristic points and 3 characteristic line sections. The positions of characteristic points represent combination of horizontal shifting effect and filling effect. And the slopes of characteristic line sections represent planarization of film surface. This model can be used as an analysis tool of many important parameters in the coating process to control the disc quality. Finally the closed loop production control is realized.

关 键 词：可写光盘 染料旋涂 光密度 曲线模型 工艺参数 闭环控制 

分 类 号：TQ597[化学工程—精细化工] TP333.4[自动化与计算机技术—计算机系统结构]