正方形钛试样表面等离子体基离子注入氮的保留剂量研究  

Retained dose analysis for nitrogen plasma based ion implantation of square-shaped titanium sample

作　　者：孙琦[1] 夏立芳[1] 马欣新[1] 

机构地区：[1]哈尔滨工业大学材料科学与工程学院,黑龙江哈尔滨150001

出　　处：《材料科学与工艺》2003年第3期273-276,共4页Materials Science and Technology

摘　　要：为了研究靶形状对等离子体基离子注入均匀性的影响,应用Auger电子能谱(AES)剖面分析,测量并计算了正方形靶表面排布的Ti试样经氮等离子体基离子注入(PBII)的保留剂量分布.由于N的Auger电子发射能量与Ti的完全重合,而且表面氧化层对Ti的Auger跃迁产生很大的影响,因此应用AES对于氮等离子体基离子注入钛基金属进行化学分析变得较为复杂.本文探讨了一种既解决峰位重叠问题又考虑氧化层影响的方法,从而能够根据AES溅射剖面分析数据计算浓度深度曲线,并获得保留剂量.正方形靶表面不同位置处的剂量测算结果表明,靶的形状对于保留剂量有着很大的影响,造成剂量呈梯度分布.同时还发现,Ti氧化层随着保留剂量的增大而增厚.Dose analysis of nitrogen plasma based ion implantation (PBII) of a square-shaped titanium sample was carried out by AES sputter depth profiling, which took into account the influence of titanium oxide and solvesd the overlap problem, and converted AES data in to a concentration depth profile to acquire the retained dose in the substrate. The results measured at different positions on the square-shaped sample showed that, the shape of the target has a significant influence on the retained dose and causes a retained dose distribution on the sample surface. The thickness of the titanium oxide increases with the increasing retained dose.

关 键 词：钛 等离子体基离子注入 氮 保留剂量 均匀性 靶 

分 类 号：TG174.444[金属学及工艺—金属表面处理]