3英寸双面YBCO高温超导外延薄膜研究  

DEPOSITION OF 3-INCH DOUBLE-SIDED YBCO HIGH-T_c SUPERCONDUCTING EPITAXIAL THIN FILMS

作　　者：陈家俊[1] 陶伯万[1] 邓新武[1] 刘兴钊[1] 李德红[1] 张鹰[1] 何世明[1] 李言荣[1] 羊恺[1] 张其劭[1] 

机构地区：[1]电子科技大学,成都610054

出　　处：《低温物理学报》2003年第A01期16-19,共4页Low Temperature Physical Letters

摘　　要：本文采用倒筒直流溅射方法 (ICS)结合基片变速双轴旋转方式原位生长Φ3英寸双面YBCO高温超导外延薄膜 .膜厚分布最大偏差小于 1 0 % ,薄膜样品的中心与边缘部分的Tc0均达到 90K ,ΔTc≤ 0 .3K ,FWHM(0 0 5)≈ 0 .2°,Rs(1 0GHz,77K)≈ 0 .8mΩ ,Jc 值分布在 2 .2～3 .1MA·cm-2 之间 ,表明样品均匀性良好 .Double-sided epitaxial YBCO High-T-c superconducting thin films have been deposited on 3-inch substrates by Inverted Cylindrical DC Sputtering (ICS). The modulating biaxial substrate rotation ensures the thickness homogeneity with the maximum deviation less than 10%. YBCO samples are highly c-axial oriented with T-{c0}≥90K, ΔT-c≤0.3K, FWHM(005)≤0.2°, R-s(10GHz, 77K)≈0.8mΩ on both of the center and the edge. The distribution of J-c, which ranges from 2.2 to 3.1MA·cm+{-2}, is also given.

关 键 词：高温超导 YBCO外延薄膜 倒筒直流溅射法 膜厚分布 微波表面电阻 微波器件 X射线衍射 

分 类 号：O484[理学—固体物理]