钼薄膜的制备、力学性能和磨损性能  

Preparation, Mechanical and Tribological Properties of Molybdenum Thin Films

作　　者：许世红[1] 王金清[1] 刘维民[1] 阎鹏勋[2] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑国家重点实验室 [2]兰州大学等离子体与金属材料研究所,甘肃兰州730000

出　　处：《材料保护》2003年第12期11-13,共3页Materials Protection

基　　金：国家自然科学基金资助(50272068)

摘　　要：　采用直流磁控溅射技术在GCr15轴承钢底材上沉积了钼薄膜。利用XRD,AFM对不同负偏压下沉积的钼薄膜的结构和表面形貌进行了表征;利用纳米压痕仪对薄膜的硬度和膜基结合强度进行了测定;最后利用DF PM型动静摩擦系数精密测定仪和扫描电镜(SEM)研究了薄膜的硬度、残余模量与负偏压的关系。结果表明:利用直流磁控溅射法制备的钼薄膜的硬度随负偏压的变化存在最大值,另外负偏压还影响薄膜的微结构、粗糙度以及膜基结合力,但负偏压的改变对钼薄膜的摩擦系数影响不大。Molybdenum (Mo) thin films were prepared by direct current (DC) magnetron sputtering system method. The structure and morphology of the films were analyzed by X-ray diffraction spectrometer and atomic force microscopy (AFM). The effect of negative substrate bias voltage on the nanohardness of thin films was studied with nanoindentation technique. The friction behavior of thin films was investigated with a one-way reciprocating friction tester. The worn surface of films was analyzed by using SEM. As a result, the nanohardness of thin films was highest at -60 V. The structure and bonding strength of films were affected by the bias as well.

关 键 词：摩擦学 钼薄膜 薄膜硬度 力学性能 磨损性能 微结构 纳米压入 直流磁控溅射法 表面改性 

分 类 号：TB43[一般工业技术]