ZnS基电致发光薄膜及其制备方法  

Electroluminescent ZnS-based Thin Films and Their Preparation

作　　者：王宝义[1] 张仁刚[1] 万冬云[1] 王雨田[1] 魏龙[1] 

机构地区：[1]中国科学院高能物理研究所核分析室,北京100039

出　　处：《材料导报》2003年第11期33-35,29,共4页Materials Reports

基　　金：国家自然科学基金(19927001)

摘　　要：ZnS是一种优良的光电材料并获得了广泛的应用。介绍了ZnS基薄膜电致发光器件的发展历史、结构及发光机理,主要讨论了ZnS基发光薄膜及蒸发法、溅射法、化学气相沉积法、外延法和溶胶-凝胶法等制备方法的最新研究进展,指出了目前存在的问题及今后的发展趋势。ZnS is a promising optoelectronic material that has wide applications.'The history of research on ZnS-based thin film electroluminescent devices and its basic structure and electroluminescent mechanism are summarized in this paper. Particularly, the authors discuss electroluminescent ZnS-based thin films and their preparation methods,including vacuum evaporation,sputtering,chemical vapor deposition,epitaxy,sol-gel and so on. Finally,some problems and future directions in this area are pointed out.

关 键 词：ZnS基电致发光薄膜 蒸发法 溅射法 化学气相沉积法 外延法 溶胶-凝胶法 

分 类 号：TN383.1[电子电信—物理电子学] TN304.055