类金刚石碳膜在各种后处理条件下稳定行为的研究  

THE STABILITY BEHAVIOR OF DIAMOND-LIKE CARBON FILMS UNDER DIFFERENT POST-TREATMENT CONDITIONS

作　　者：王维洁[1] 陈智颖[1] 王天民[1] 

机构地区：[1]兰州大学材料科学系,730000

出　　处：《微细加工技术》1992年第2期62-69,共8页Microfabrication Technology

摘　　要：本文介绍了类金刚石碳膜的结构和性能在高能离子束辐照、真空热退火及脉冲激光辐照等后处理条件下的变化特征,并就该膜在各种处理条件下的相变机制研究现状进行了评述。The characteristics change of physical, mechanical and chemical properties of diamond-like carbon films after high energy ion beam irradiations, vacuum annealing and pulsed-laser beam bombardment are introduced. The present state in studying the transformation mechanisms of the films under different post-treatment conditions are reviewed.

关 键 词：后处理条件 类金刚石 碳膜 

分 类 号：TN304.18[电子电信—物理电子学]