一步法紫外曝光制备TiO_2光敏凝胶光栅的初步研究  

Single-step fabrication of diffraction grating on TiO_2 photosensitive gels film by direct UV irradiation

作　　者：周斌[1] 邱恒山[1] 刘小林[1] 沈军[1] 吴广明[1] 孙骐[1] 黄耀东[1] 艾琳[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《强激光与粒子束》2004年第3期305-308,共4页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题

摘　　要：　以钛酸丁酯和苯甲酰丙酮为原料,经sol gel工艺,获得具有负性光刻胶性质的TiO2光敏凝胶薄膜。它的敏感波长在360nm附近,与反应生成的螯合环有关。结合掩模曝光和显影工艺,将条状或网格状的光栅图形引入光敏凝胶表面,获得光敏凝胶光栅。TiO2 photosensitive gel films are derived from chemically modified metal-alkoxide with benzoylacetone by sol-gel process. The gel films show an absorption band at around 360 nm, characteristic of the remaining chelate rings. The negative tone gel films are irradiated by UV light through a mask with different pattern to prepare grating pattern on gel films. Depending on the exposure time, the gel films are leaching with ethanol and the grating with different structure on TiO2 photosensitive gel films are obtained.

关 键 词：光敏凝胶 紫外曝光 掩模 溶胶-凝胶工艺 

分 类 号：O484.4[理学—固体物理]