反应磁控溅射法制备nc-TiN/a-Si_3N_4薄膜的Young's模量和内耗  

INTERNAL FRICTION AND YOUNG'S MODULUS OF THE nc-TiN/a-Si3N4 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING METHOD

作　　者：李朝升[1] 王先平[1] 方前锋[1] S.Veprek 李世直[3] 

机构地区：[1]中国科学院固体物理研究所材料物理重点实验室 [2]Institute for Chemistry of Inorganic Materials, Technical University Munich, D-85747, Munich, Germany [3]青岛科技大学材料与环境科学学院

出　　处：《金属学报》2003年第11期1193-1196,共4页Acta Metallurgica Sinica

基　　金：国家自然科学基金10274086;德国大众汽车基金I/77 192资助项目

摘　　要：利用振簧技术测量了不同退火状态下的nc-TiN/a-Si3N4超硬薄膜的Yong's模量和内耗随温度的变化关系.在280—300℃附近观察到一个弛豫内耗峰.随着退火温度的升高,该内耗峰逐渐减弱,而Young's模量变化不大.750℃退火后,该内耗峰消失,而模量却从未退火时的430 GPa激增至530 GPa.初步认为该内耗峰来源于非稳定界面的弛豫过程.The vibrating reed technique is used to evaluate the Young's modulus and internal friction of nc-TiN/a-Si3N4 superhard films. A relaxation peak is observed around 280℃ in the as-received film. With increasing the annealing temperature, this peak weakens and the Young's modulus at room temperature changes slightly. After annealing at 750℃, this peak disappears while the modulus increases from the value of 430 GPa in the un-annealed status to a value of 530 GPa. This internal friction peak is suggested to be associated with the relaxation process of the unstable interface.

关 键 词：纳米TiN/非晶Si3N4薄膜 内耗 Young’8模量 非稳定界面 

分 类 号：TG113.22[金属学及工艺—物理冶金] TB383[金属学及工艺—金属学]