声表面波卷积器/存储相关器用ZnO膜的制备  

The Preparation of ZnO Films for SAW Convolver/ Storage Correlators

作　　者：陈运祥[1] 杨龙其 王宗富[1] 

机构地区：[1]四川压电与声光技术研究所

出　　处：《压电与声光》1992年第2期38-40,37,共4页Piezoelectrics & Acoustooptics

摘　　要：本文介绍了声表面波(SAW)卷积器/存储相关器用优质氧化锌(ZnO)压电膜的制备方法。用平面磁控溅射技术溅射ZnO陶瓷靶沉积出了激励SAW西沙瓦模式的优质ZnO膜。用同轴磁控溅射技术溅射ZnO陶瓷靶沉积出的优质ZnO膜制作ZnO/Si单片式SAW卷积器,使该器件性能进一步改善,同时给出了相应的实验结果。This paper decribed the preparing method of premium piezoelectric ZnO films used for SAW convolver/storage correlators. The premium ZnO films excit-de Sezawa mode SAW have been deposited by the planar magnetron sputtering the ceramic ZnO target. Using the RF magnetron coaxide sputtering system,we have also made excellent ZnO films for the monolithic ZnO/Si SAW convolver,and the performances of the devices have further been modified. The corresponding experimental results are also presented in the paper.

关 键 词：ZnO膜 声表面波器件 卷积器 制备 

分 类 号：TN65[电子电信—电路与系统]