纳米晶钛膜中氦注入的保持剂量  

Preservation dose of helium-implanted in nanocrystal titanium films

作　　者：郑思孝[1] 罗顺忠[2] 刘仲阳[1] 龙兴贵[2] 王培禄[1] 彭述明[2] 廖小东[1] 刘宁[1] 

机构地区：[1]四川大学原子核科学技术研究所,辐射物理及技术教育部重点实验室,成都610064 [2]中国工程物理研究院核物理与化学研究所,绵阳621900

出　　处：《物理学报》2004年第2期555-560,共6页Acta Physica Sinica

基　　金：国家自然科学基金 (批准号 :10 2 760 2 3 );中国工程物理研究院联合基金 (NSAF)资助的课题~~

摘　　要：在从室温到 5 0 0℃的温度范围内 ,用卢瑟福质子背散射技术分别测量了不同能量、不同剂量注入的纳米晶钛膜中氦的浓度分布 ,不同温度时的保持剂量及其释放浓度 .发现氦在这种纳米晶粒膜中其氦 -钛原子浓度比达到4 1%— 5 2 %时能在室温到 10 0℃的温度下长期稳定保持 ,若其原子浓度达 5 2 %— 74 %时也能在室温环境有效保持 .Helium concentration profile, preservation dose and release rate from a nanocrystal titanium film implanted with helium at different energy and dose have been measured by proton Rutherford backscattering technique in a range from room temperature to 500℃. It is observed that the implanted helium may be stably preserved for a long time in the nanocrystal titanium film in the temperature environment from room temperature to below 100℃ when its concentration in up to 41%—52% of He-Ti atomic ratio, and also may be effectively preserved for a long time at room temperature if their atomic concentration ratio is up to 52%—74%. Possible mechanism of helium effectively preserved in the nanocrystal film with a large boundary volume ratio is preliminarily discussed from the energy viewpoint in this paper.

关 键 词：离子注入 纳米晶粒钛膜 氦注入 保持剂量 卢瑟福质子背散射技术 纳米技术 

分 类 号：O571[理学—粒子物理与原子核物理]