Microstructure and AMR Properties of Permalloy Films Sputtered on (Ni_ (0.81)Fe_(0.19)_ (0.66)Cr_(0.34 )Buffer  

作　　者：杨晓非 

机构地区：[1]Huazhong University of Science and Technology

出　　处：《Journal of Wuhan University of Technology(Materials Science)》2004年第1期23-25,共3页武汉理工大学学报（材料科学英文版）

基　　金：FundedbytheNaturalScienceFoundationofHubeiProvince(No .2 0 0 2AB0 32 )

摘　　要：Ni 0.81Fe 0.19) 0.66Cr 0.34 has a high resistivity and a crystal structure close to that of Ni 0.81Fe 0.19.The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-oriented Ni 0.81Fe 0.19 film.Post-annealing treatment improves the magnetic properties of (Ni 0.81Fe 0.19) 0.66Cr 0.34(45?)/Ni 0.81Fe 0.19(150?)/Ta(55?) thin film prepared under a deposition field,whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.Ni 0.81Fe 0.19) 0.66Cr 0.34 has a high resistivity and a crystal structure close to that of Ni 0.81Fe 0.19.The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-oriented Ni 0.81Fe 0.19 film.Post-annealing treatment improves the magnetic properties of (Ni 0.81Fe 0.19) 0.66Cr 0.34(45?)/Ni 0.81Fe 0.19(150?)/Ta(55?) thin film prepared under a deposition field,whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.

关 键 词：permalloy film AMR buffer layer 

分 类 号：TB43[一般工业技术]