透镜阵列光刻法消差原理分析  

Analysis on error-eliminate by lens array photolithography method

作　　者：喻洪麟[1] 王远干[2,3] 黄尚廉[1] 

机构地区：[1]重庆大学光电技术及系统国家教育部重点实验室 [2]重庆大学数理学院 [3]广西钦州师专数学系,广西钦州535000

出　　处：《光电工程》2004年第3期12-15,共4页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(50079032)

摘　　要：透镜阵列光刻法用一个柱面阵列透镜代替常规光刻法中的柱面透镜形成光程差,将由衍射所引起的瞬变图形错开,消除由于光刻模板与被刻光栅之间因间隙引起的衍射误差。用光学传递函数方法说明了透镜阵列消除光刻中衍射误差的原理。实验表明透镜阵列光刻法,可以较好的消除衍射误差,研制出高质量的光栅。The optical path difference formed by replacing the cylindrical lens in common photolithography with a cylindrical lens array in lens array photolithography shall stagger the transient image caused by diffraction, thus eliminating the diffraction error caused by the gap between the photolithographic template and the etching grating. The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method. The experiments show that the diffraction error can be eliminated with lens array photolithography method and high-quality grating can be developed.

关 键 词：透镜阵列 光刻 夫琅和费衍射 衍射误差 

分 类 号：TN305.7[电子电信—物理电子学]