具有更低折射率比的全向高反膜的设计  

Design of omnidirectional high reflector with lower refractive indices ratio

作　　者：林小燕[1] 吴永刚[1] 顾春时[1] 王利[1] 魏军明[1] 田国勋[1] 王勇[1] 陈玲燕[1] 

机构地区：[1]同济大学精密光学工程技术研究所,上海200092

出　　处：《光学仪器》2004年第2期12-15,共4页Optical Instruments

基　　金：国家自然科学基金资助项目(10175049)

摘　　要：对于λ/4膜系,如欲实现宽带全向反射,宜采用高折射率比的镀膜材料,讨论了在低折射率比条件下的全向高反膜。借助Filmstar膜系设计软件对所设计的几种初始膜系进行了优化,并分析了材料折射率和吸收以及膜厚误差对优化结果的影响。在此基础上,采用高斯分布的初始膜系,优化设计了高低折射率分别为2.16和1.44的全向高反膜。它在530nm处对任意入射角都具有98%以上的反射率,并在530nm～560nm波段内对从0°～60°入射的光具有99%以上的反射率。Usually high refractive indices ratio is believed the essential requirement to achieve wide band omnidirectional reflection with quarter-wave dielectric stacks, however in this paper, a high omnidirectional reflector with lower refractive indices ratio is achieved with a particularly designed dielectric stacks. Firstly an optimal result of several different preliminary dielectric multilayers is compared with Filmstar software. Then the refractive indices, absorption of material and the thickness error that affect the optical properties of the designed stacks are analyzed. And finally an omnidirectional high reflector with the high refractive index (2.16) and low (1.44) is designed by using Gaussian distribution as an initial film thickness distribution. The designed omnidirectional high reflector has the reflectance above 98% at 530nm for any incident angle and above 99% in 530nm^560nm for incidence angles between 0 degree to 60 degree .

关 键 词：高斯分布 λ/4膜系 全向高反膜 设计 折射率 

分 类 号：O484.41[理学—固体物理]