Ag-NiMnGa颗粒膜分析  

Studies on the AgNiMnGa Granular Films

作　　者：刘存业[1] 李建[1] 匡安龙[1] 倪刚[2] 

机构地区：[1]西南师范大学物理学院,重庆400715 [2]南京大学固体微结构国家重点实验室,江苏南京210093

出　　处：《西南师范大学学报（自然科学版）》2004年第3期390-393,共4页Journal of Southwest China Normal University(Natural Science Edition)

摘　　要：利用离子束溅射技术制备了AgNiMnGa颗粒膜的系列样品.分别采用广角X射线衍射(WXRD)技术和掠入射X射线散射(GIXS)技术分析了样品的物相组成和膜面与内层结构,NiMnGa颗粒平均尺寸为5 5nm;样品膜厚度为463nm.对样品电磁性能的研究表明:颗粒膜在室温下磁场扫描测量中呈现明显的磁致电阻效应;其伴随有振荡的非线形电流电压关系揭示了介观系统具有的输运特征.A series of AgNiMnGa nano-granular films with different combinations of component materials were fabricated by using ion-beam sputtering technique. The surface and internal microstructure of the samples with the film thickness of 463 nm and nanoscale NiMnGa dots (about 5.5 nm) were analyzed by wide angle X-ray diffraction (WXRD) and grazing incidence X-ray scattering (GIXS) techniques. Research on electrical and magnetic properties shows clearly that the magnetic granular films show the magnetoresistance effect at room temperature and the non-linear current-voltage curves exhibit the transport character of mesoscopic systems.

关 键 词：颗粒膜 磁电阻 离子束溅射 

分 类 号：O484.43[理学—固体物理]