电子束蒸发制备TiO₂/云母薄膜及其光学和光催化性能研究  

Study on the Optical and Photocatalytic Properties of TiO2/Mica Thin Films Fabricated by Electron-Beam Evaporation Method

作　　者：阿不都哈比尔•木太里甫 买买提热夏提•买买提 王淑英[1] 阿卜杜外力•米吉提 阿不都热苏力•阿不都热西提 

机构地区：[1]新疆大学物理科学与技术学院,新疆 乌鲁木齐

出　　处：《材料科学》2021年第9期967-975,共9页Material Sciences

摘　　要：本文研究了退火温度对TiO2/云母薄膜的表面形貌,晶体结构和光学性质的影响和应力对光催化效率的影响。实验结果表明,随着退火温度的升高,晶粒尺寸变大,薄膜的带隙能变小。对比TiO2/云母薄膜受压力影响和自然状态下的光催化降解实验:没有受压力影响时,在600℃,650℃和700℃温度下退火薄膜的降解率分别为8.56%,5.78%和2.39%;受压力影响后,在600℃,650℃和700℃温度下退火薄膜的降解率分别为8.79%,6.89%和3.28%。实验结果表明,受压力影响的样品降解率较大于自然状态下的样品降解率,退火温度650℃下受压力影响的样品降解率的提升程度大于600℃和700℃下受压力影响的样品降解率的提升程度,这说明应力对薄膜光催化降解率的提高有一定的促进作用。In this work, we studied the effect of annealing temperature on the surface morphology, crystal structure and optical properties of TiO2/mica films and the effect of stress on the photocatalytic efficiency. The experimental results show that as the annealing temperature increases, the grain size becomes larger and the band gap energy of the film becomes smaller. We also did experiments on photocatalytic degradation of TiO2/mica film under pressure and under natural conditions. The experimental results show that: without the pressure, the degradation rates of the annealed films at 600˚C, 650˚C and 700˚C are 8.56%, 5.78% and 2.39%, respectively;after the pressure is affected, the degradation rates of the annealed films at 600˚C, 650˚C and 700˚C are 8.79%, 6.89% and 3.28%, respectively. The results indicate that the degradation rate of samples affected by pressure is greater than the degradation rate of samples under natural conditions, and the degradation rate of samples affected by pressure at annealing temperature of 650˚C increases more than the degradation rate of samples affected by pressure at 600˚C and 700˚C. The degree of improvement indicates that the stress has a certain promoting effect on the improvement of the photocatalytic degradation rate of the film.

关 键 词：电子束蒸发法 TiO₂薄膜 光催化性能 

分 类 号：TB3[一般工业技术—材料科学与工程]