supported by National Nature Science Foundation of China under Grant Nos.61178022 and 61575030;Research funds for the Doctoral program of Higher Education of China(No.20112216120006,20122216120009);supported by the Science and Technology Department of Changchou City(No.14KP007)
In this work,we investigated the influence of air gas pressures on the expansion features of nanosecond laser ablated aluminum plasma in the absence and presence of a nonuniform magnetic field using fast photography.A...
supported by National Natural Science Foundation of China(No.61178022);the Research Foundation for Doctoral Program of Higher Education of China(Nos.20112216120006,20122216120009 and 20122216110007);the Project of 14KP007
In this work, we investigated the plasma morphology induced by a Nd:YAG laser with the aim of improving the understanding of the formation and dynamics of the plasma in two cases, with and without a magnetic field. S...
Project supported by the National Key Basic Research Program,China(Grant No.2013CB922404);the National Natural Science Foundation of China(Grant Nos.61178022,11074027,11274053,and 11211120156);the Funds from Science and Technology Department of Jilin Province,China(Grant Nos.20111812 and 20130522149JH);the Research Fund for the Doctoral Program of Higher Education of China(Grant Nos.20122216120009,20122216110007,and 20112216120006)
The propagation of a plasma shock wave generated from an Al target surface ablated by a nanosecond Nd:YAG laser operating at 355 nm in air is investigated at the different focusing positions of the laser beam by usin...
supported by the National Basic Research Program of China (Grant No. 2013CB922404);the National Natural Science Foundation of China (Grant Nos. 11074027,61178022,11274053,and 11211120156);the Science & Technology Department of Jilin Province,China (Grant No. 20111812);the Research Fund for the Doctoral Program of Higher Education of China (Grant Nos. 20122216120009,20122216110007,and 20112216120006);the Young Scientists Fund of Changchun University of Science and Technology,China (Grant No. 000520).
For the next-generation beyond extreme ultraviolet lithography (EUVL) sources, gadolinium (Gd) plasma with emis- sion wavelength at 6.7 nm seems to be the leading candidate. Similar to the Sn target 13.5 nm light ...