Supported by the National Natural Science Foundation of China under Grant Nos 61334002 and K5051325020.
We present a detailed analysis of the trap states in atomic layer deposition Al2O3/InAlN/GaN high electron mobility transistors grown by pulsed metal organic chemical vapor deposition. Trap densities, trap energies an...
Supported by the National Natural Science Foundation of China (60776017), the State Key Projects (2009ZX02039-003, 2009ZX02022-002, 2009ZX02035-005), and the Fund of State Key Laboratory of ASIC and System (09MS004). We acknowledge Professor Xingao Gong for help in the calculation.
We perform a first-principles calculation based on density functional theory to investigate the interface between single layer graphene and metal oxides. Our study reveals that the monolayer graphene becomes semicondu...
A Ge2Sb2Te5 based phase change memory device cell integrated with metal-oxide semiconductor field effect transistor (MOSFET) is fabricated using standard 0.18 #m complementary metM-oxide semiconductor process techno...