TRICHLOROSILANE

作品数:16被引量:10H指数:1
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相关领域:理学更多>>
相关期刊:《China Chemical Reporter》《International Journal of Organic Chemistry》《Advances in Chemical Engineering and Science》《Journal of Materials Science and Chemical Engineering》更多>>
相关基金:国家自然科学基金更多>>
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Thermodynamic analysis of manufacturing polysilicon from Si HCl_3,Si Cl_4 and H_2被引量:1
《Chinese Journal of Chemical Engineering》2015年第4期681-688,共8页李佩龙 王铁峰 
Supported by the Beijing New Star Project on Science & Technology of China(2009B35);the Program for New Century Excellent Talents in University(NCET-12-0297)
Production of polysilicon by chemical vapor deposition of SiHCI3 with a fluidized bed reactor is a competitive technology. As equilibrium conversion can be approached in a fluidized bed reactor, a reliable thermodynam...
关键词:ThermodynamicsPolysiliconFluidized bedTrichlorosilaneSilicon tetrachtoride 
Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane被引量:1
《Chinese Journal of Chemical Engineering》2014年第3期287-293,共7页孙帅帅 黄国强 
The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results ...
关键词:reactive distillation reaction kinetics trichlorosilane redistribution pumparound monosilane 
Effect of Boundary Layers on Polycrystalline Silicon Chemical Vapor Deposition in a Trichlorosilane and Hydrogen System被引量:5
《Chinese Journal of Chemical Engineering》2011年第1期1-9,共9页张攀 王伟文 陈光辉 李建隆 
Supported by the Natural Science Foundation of Shandong Province of China (ZR2009BM011); the Doctor Foundation of Shandong Province of China (BS2010NJ005)
This paper presents the numerical investigation of the effects of momentum, thermal and species boundary layers on the characteristics of polycrystalline silicon deposition by comparing the deposition rates in three c...
关键词:boundary layer polycrystalline silicon numerical simulation mass diffusion 
Variation of Surface Adhesion Force During the Formation of OTS Self-assembled Monolayer Investigated by AFM
《Chinese Journal of Chemical Engineering》1999年第4期345-350,共6页徐国华 HigashitaniKo 
Partially supported by Scientific Research Foundation for Returned Overseas Chinese Scholars,State Education Committee.
Variation of the surface adhesion force during the formation of octadecyl trichlorosilane (OTS) self-assembled monolayer on a glass substrate surface was investigated by atomic force microscope (AFM). The research sho...
关键词:surface adhesion force atomic force microscope octadecyl trichlorosilane selfassembled monolayer 
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