POLISHING

作品数：210被引量：349H指数：10
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相关领域：金属学及工艺更多>>
相关作者：辛企明康仁科霍凤伟金洙吉赵福令更多>>
相关机构：大连理工大学东华大学北京理工大学南昌大学更多>>
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相关基金：国家自然科学基金国家重点基础研究发展计划广东省自然科学基金河北省自然科学基金更多>>
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Wear behavior of copper material removal during fluid jet polishing:A comparative study between experiment and simulation
《Friction》2024年第8期1680-1695,共16页Wenjing ZHANG Xin ZHANG Tiancheng AI Dan GUO Guoshun PAN 
supported by the National Natural Science Foundation of China(No.52175175);Shenzhen Science and Technology Program(No.JCYJ20220818102809020).
As a crucial part in micro-electromechanical manufacture,local ultra-precision processing of highly ductile copper is expected to be realized by fluid jet polishing(FJP),which widely utilized in optical elements.Since...
关键词：fluid jet polishing(FJP) wear mechanism computational fluid mechanics wear model material removal 
Modeling and analysis for material removal and surface roughness in fluid jet polishing of optical glass
《Friction》2024年第7期1548-1563,共16页Zhongchen CAO Ming WANG Haitao LIU Tian HUANG 
the National Natural Science Foundation of China(No.51905376).
luid jet polishing(FJP)is a non-contact polishing technology that can fabricate free-form optical surfaces with sub-micron-level form accuracy and nano-level surface roughness,especially for hard and brittle materials...
关键词：fluid jet polishing(FJP) computational fluid dynamics(CFD) material removal mechanism surface roughness theoretical model 
Mode transition from adsorption removal to bombardment removal induced by nanoparticle-surface collisions in fluid jet polishing被引量：5
《Friction》2021年第5期1127-1137,共11页Xuechu ZHAO Liran MA Xuefeng XU 
The work is financially supported by the National Natural Science Foundation of China(Nos.51575054 and 51527901);the Fundamental Research Funds for the Central Universities(No.YX2013‐02).
The effects of impacting particles from a jet of liquid on the removal of a surface material(on the impacted workpiece)were investigated.Experimental observations show that the cross section of the material removed ch...
关键词：ultra‐smooth surface fluid jet polishing nanoparticle-surface collision material removal 
Abrasive-free polishing of hard disk substrate with H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry被引量：1
《Friction》2013年第4期359-366,共8页Weitao ZHANG Hong LEI 
supported by the National Natural Science Foundation of China(Grant No.51175317);Research Fund for the Doctoral Program of Higher Education of China(Grant No.20123108110016);Tribology Science Fund of State Key Laboratory of Tribology(No.SKLTKF11B06).
The effect of tert-butyl hydroperoxide-sodium pyrosulfite((CH3)3COOH-Na2S2O5)as an initiator system in H2O2-based slurry was investigated for the abrasive-free polishing(AFP)of a hard disk substrate.The polishing resu...
关键词：abrasive-free polishing material removal rate initiator hard disk substrate 
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