National Natural Science Foundation of China(Grant Nos.61421005,61534004,60806033,61474004);National High Technology Research and Development Program of China(Grant No.2015AA016501);National Key Research and Development Plan(Grant No.2016YFA0200504)
Dear editor,Ge is considered as a promising channel material to replace Si because of its high carrier mobility than Si and compatibility with conventional Si process[1–3].Strain engineering has been widely used in S...