HETEROEPITAXY

作品数:39被引量:36H指数:3
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相关作者:孙殿照赵万顺王雷曾一平孙国胜更多>>
相关机构:中国科学院更多>>
相关期刊:《Science China(Physics,Mechanics & Astronomy)》《Science China(Technological Sciences)》《Science China Mathematics》《Frontiers of Materials Science》更多>>
相关基金:国家自然科学基金国家重点基础研究发展计划国家高技术研究发展计划北京市自然科学基金更多>>
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Two-dimensional material-assisted remote epitaxy and van der Waals epitaxy: a review被引量:1
《National Science Open》2023年第4期86-102,共17页Zhetong Liu Bingyao Liu Zhaolong Chen Shenyuan Yang Zhiqiang Liu Tongbo Wei Peng Gao Zhongfan Liu 
The work was supported by the National Key R&D Program of China(2019YFA0708200);the National Natural Science Foundation of China(T2188101,52125307,52021006 and 12074369);the“2011 Program”from the Peking-Tsinghua-IOP Collaborative Innovation Center of Quantum Matter,Youth Innovation Promotion Association,CAS;the Youth Supporting Program of Institute of Semiconductors.
Heteroepitaxy can reduce the cost and widen the application range of semiconductor film synthesis and device fabrication.However,the lattice and thermal expansion coefficient mismatches between epilayers and substrate...
关键词:GRAPHENE 2D materials HETEROEPITAXY remote epitaxy pinhole epitaxy van der Waals epitaxy 
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