PHOTOMASK

作品数：2被引量：4H指数：2
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Comparison of EUV Photomask Metrology Between CD-AFM and TEM被引量：2
《Nanomanufacturing and Metrology》2022年第2期91-100,共10页Gaoliang Dai Kai Hahm Lipfert Sebastian Markus Heidelmann 
Open Access funding enabled and organized by Projekt DEAL.
Accurate metrology of extreme ultraviolet (EUV) photomask is a crucial task. In this paper, two different methods for reference EUV photomask metrology are compared. One is the critical dimension atomic force microsco...
关键词：Extreme ultraviolet(EUV)photomask standard Traceable calibration METROLOGY Critical dimension(CD) Atomic force microscopy(AFM) Transmission electron microscopy(TEM) High precision Low measurement uncertainty 
An inkjet printing soft photomask and its application on organic polymer substrates被引量：2
《Science China Chemistry》2010年第8期1695-1704,共10页WANG LuLin1,MA YuHong2,CHEN MengJun1,YAO Hui1,ZHENG XiaoMan1 & YANG WanTai1,2 1State Key Laboratory of Chemical Resource Engineering College of Materials Science and Engineering,Beijing University of Chemical Technology,Beijing 100029,China 2Key Laboratory of Carbon Fiber and Functional Polymers,Ministry of Education Beijing University of Chemical Technology,Beijing 100029,China 
supports from the Changjiang Scholars and Innovative Research Team in University (IRT 0706);Program of Introducing Talents of Discipline to Universities (B08003) are greatly appreciated
This article presents a simple,fast and low-cost method to fabricate a flexible UV light photomask.The designed micropatterns were directly printed onto transparent hybrid composite film of biaxially oriented polyprop...
关键词：PHOTOMASK CPO PHOTOCHEMICAL surface modification MICROPATTERNING PATTERNING POLYANILINE photograft 
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