MO/SI

作品数:67被引量:142H指数:7
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相关领域:理学机械工程更多>>
相关作者:王占山朱京涛张众金春水喻波更多>>
相关机构:同济大学中国科学院长春光学精密机械与物理研究所中国科学技术大学中国科学院更多>>
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相关基金:国家自然科学基金国家高技术研究发展计划国家教育部博士点基金国家科技重大专项更多>>
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Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range被引量:1
《Chinese Optics Letters》2011年第2期79-82,共4页谭默言 李浩川 黄秋实 周洪军 霍同林 王晓强 朱京涛 
supported by the National Natural Science Foundation of China (Nos. 10825521, 10905042,10975139, and 10876023);the Shanghai Committee of Science and Technology (Nos. 09XD1404000 and09ZR1434300);Shanghai Municipal Education Commission and Shanghai Education Development Foundation(No. Chen Guang2008CG25);Young Talents Foundation of Tongji University
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a num...
关键词:Mirrors Numerical methods REFLECTION Synchrotron radiation 
B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm
《Chinese Optics Letters》2006年第10期611-613,共3页王占山 张淑敏 吴文娟 朱京涛 王洪昌 李存霞 徐垚 王风丽 张众 陈玲燕 周洪军 霍同林 
This work was supported by the National Natural Science Foundation of China (No. 60378021 and 10435050)the Program for New Century Excellent Talents in University (No. NCET-04-0376)the Science Fund of Tongji University.
The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/M...
关键词:Magnetron sputtering MULTILAYERS REFLECTION Synchrotron radiation 
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