熔凝玻璃薄膜的形成及其C-V特性  

Preparation of Fused Glass Films and Their C-V Characteristics

作　　者：戴国瑞[1] 孙颖[1] 童茂松[1] 王宗昌[1] 张英兰[1] 

机构地区：[1]吉林大学电子工程系,长春130023

出　　处：《稀有金属》2001年第3期187-190,共4页Chinese Journal of Rare Metals

摘　　要：报道了在成功地研制彩色电视机用的高反压大功率晶体管钝化玻璃粉的基础上 ,摸索了采用电泳涂覆技术以形成一定厚度的高质量熔凝玻璃薄膜的方法 ,用差热分析 (DTA)技术确定了玻璃粉的软化温度、烧结温度分别为 5 90和 6 80℃。用X射线衍射 (XRD)和光电子能谱 (XPS)对薄膜的物相和组份进行了分析 ,同时 ,将熔凝玻璃薄膜做成金属 绝缘体 半导体 (MIS)结构 ,对样品进行了C V特性测量 ,固定电荷密度为 1 4× 10 10 cm-2 ,可动离子数为 1 2× 10 11cm-2 。Passivation glass powders used in the high breakdown voltage and high power transistors of color TV were obtained. Based on these works, electrophoretic coating method was used to deposit the high quality fused glass films. The softening and sintering temperature of 590℃ and 680℃ of the fused glass powder were obtained by using the different thermal analysis method. The crystal structures and compositions of the glass films were investigated by X ray diffraction (XRD) and X ray photoelectron spectrum(X...

关 键 词：玻璃薄膜 电泳涂覆 结构分析 C-V特性 

分 类 号：TB43[一般工业技术]