交叉型天线感应耦合等离子体源放电特性及均匀性  

Discharge Characteristics and Uniformity of Inductively Coupled Plasma Source with Crossing Antenna

作　　者：卢春山 辛煜[1] 孙刚 孙恺[1] 

机构地区：[1]苏州大学物理科学与技术学院薄膜材料江苏省重点实验室,苏州215006

出　　处：《真空科学与技术学报》2008年第2期174-178,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助(No.10305008)

摘　　要：本文介绍了一种交叉型天线射频感应耦合等离子体源,射频天线穿过交叉排列的石英管内置于真空腔体中。本文运用朗谬尔探针方法诊断了放电等离子体的参量及其均匀性,运用发射光谱技术进行了Ar谱线[4s’(1/2)0-4p’(1/2)]的发光强度的表征,并使用自制的Rogowski线圈测量了天线中的射频电流变化。结果表明,等离子体放电随着射频输入功率的增加存在着E模式向H模式的转变,H模式放电时发光强度及射频电流明显增大。电子温度随气压的增大而降低,几乎不受功率的影响。该等离子体源所产生的等离子体密度较高,等离子体均匀性在中心±60 mm区域内优于90%。A novel type of inductively coupled plasma(ICPs) source with a crossing antenna was successfully developed.The RF antenna were embedded in a quartz tube and installed in a vacuum chamber.Its characteristics and the uniformity of the plasma were studied with a Langmuir probe and other conventional probes.The results show that high density plasma with the uniformity higher than 90%,around the central ±60mm area,can be generated,and that the RF power significantly affects the characteristics of the plasma.For ...

关 键 词：感应耦合等离子体 天线 朗谬尔探针 发射光谱 

分 类 号：O539[理学—等离子体物理]