工件台转速对非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与性能影响  

The Influence of Substrate Table Rotation Rate on Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating

作　　者：周晖[1] 温庆平[1] 郑军[1] 桑瑞鹏[1] 万志华[1] 

机构地区：[1]兰州物理研究所表面工程技术国防科技重点实验室,甘肃兰州730000

出　　处：《润滑与密封》2008年第4期1-3,19,共4页Lubrication Engineering

基　　金：航天支撑技术项目(417010802)

摘　　要：采用非平衡磁控溅射沉积技术制备MoS2-Ti复合薄膜,研究了工件台转速对薄膜的结构和性能的影响。利用XRF和XRD分析薄膜的成分和晶相结构,用CSEM薄膜综合性能测试仪测试薄膜的硬度和与基底间的附着力,用球-盘摩擦试验机和真空环模系统评价薄膜的真空摩擦磨损性能。结果表明:提高工件台转速改善了掺杂金属Ti在薄膜中的分布均匀性,起到了细化晶粒尺寸,使薄膜组织结构致密性加强的效果。工件台转速变化不影响薄膜成分,薄膜的晶相从明显的(002)基面优势取向向准晶态转变;薄膜的硬度、与基底间的附着力都随工件台转速的提高而增大;薄膜在真空环境中的减摩作用与工件台转速无关,摩擦因数平均值为0.02,波动范围为0.01～0.04,薄膜耐磨寿命随工件台转速提高而延长。MoS2-Ti composite coating was deposited by unbalanced magnetron sputtering system,the effect of substrate table rotation rate on its structure and mechanical performance was studied.The composition and crystal structure of coating were analyzed by XRF and XRD,the nanohardness and adhesion force to substrate were measured by CSEM nanoindentation and nanoscratch tester,the tribological properties in vacuum environment were evaluated ball-on-disc friction and wear tester and vacuum simulation system.The result...

关 键 词：非平衡磁控溅射 MoS_2-Ti复合薄膜 工件台转速 结构和性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理]